钨靶材
The purity of tungsten target we produced is as high as 99.97%, its density is between 18.8-19g / cm3, with uniform microstructure and fine grains. Because of its characteristics of high melting point, high elasticity, low coefficient of thermal expansion, good resistivity and thermal stability, pure tungsten and tungsten alloy targets are widely used in semiconductor integrated circuits, flat panel displays, solar photovoltaic, X-ray tubes and surface engineering. They can be used with old sputtering equipment and instruments, or with the latest process equipment, such as large-area coating for solar cells, fuel cells and flip chip.
Tungsten Sputtering Target
The most advanced technologies has been adopted on tungsten sputtering target, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). One of the important ways to produce thin film material is sputtering physical vapor deposition (PVD). The film made from the target has the characteristics of high density and good adhesion. As a widely used magnetron sputtering technology, high-purity metal and alloy targets are very necessary. We can produce tungsten sputtering target according to customer’s requirements.
