鉬濺鍍靶材
The magnetron sputtered from molybdenum sputtering target has the characteristics of high density and strong adhesion. In addition, molybdenum has the properties of high melting point, low coefficient of thermal expansion, low resistivity, good thermal stability and ultra-fine grains; the purity of molybdenum sputtering target is more than 3N, and its density is close to the theoretical density of 10.2g/cm3. It has a uniform inner structure.
Molybdenum sputtering targets are widely used in the manufacture of LCD and touch screens, solar cells and solar hot water, conductive glass, all surface coating and rotary coating systems.
We are a professional supplier of molybdenum target. We own excellent facilities including hot rolling mills and four-high cold rolling mills. Target is formed by sintering of molybdenum powder. In most cases, it is a positive electrode after being made into molybdenum target. Molybdenum target is thick and has a glossy surface. According to customers’ requirements, we can produce various shapes of targets, such as round, porous, rectangular and so on.
Specifications of Molybdenum Sputtering Target
Disc Target
直徑: 10mm to 360mm
Thickness: 0.1mm to 10mm
Planar Target
Width: 20mm to 600mm
Length: 20mm to 2000mm
Thickness: 0.1mm to 10mm
Rotary Target
Outer diameter: 20mm to 400mm
Wall thickness: 1mm to 30mm
Length: 100mm to 3000mm
